为研制极紫外波段窄带多层膜反射镜，采用低原子序数材料组合设计了30.4 nm波长处Mg/SiC，Si/SiC，Si/B4C和Si/C多层膜反射镜，并与极紫外波段传统的Mo/Si多层膜反射镜进行对比。采用直流磁控溅射技术制备了这些多层膜，在国家同步辐射实验室辐射与计量光束线完成了多层膜反射率测量，测量结果表明：Mg/SiC多层膜的带宽最小，为1.44 nm，且反射率最高，为44%；而Mo/Si多层膜的反射率仅为24%，带宽为3.11 nm。实验结果证明了采用低原子序数材料组成的多层膜的带宽要比常规多层膜窄，该方法可以应用于极紫外波段高分辨研究。

To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi2/Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23–25 \mu m. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.

采用磁控溅射方法制备了周期数分别为10, 30, 50和75的Ni/Ti多层膜, 利用X射线掠入射反射测量了多层膜表面和界面的状态, 并用原子力显微镜测量了多层膜的表面粗糙度, 研究了不同周期数的Ni/Ti多层膜表面粗糙度的变化规律。结果表明: Ni/Ti多层膜表面粗糙度随着膜层数增加而增加, 当Ni/Ti多层膜的周期数从10变化到75时, 其表面粗糙度由0.80 nm增大到1.69 nm。实验数据拟合表明: Ni/Ti多层膜表面粗糙度与周期数成３次方关系；但在周期数较小时, 粗糙度与周期数成线性关系。

A multilayer Laue lens with a 15-nm outermost zone width is designed for an incident X-ray beam with an energy of 8 keV. WSi2/Si multilayer Laue lens with 324 layers and a total thickness of 7.9 \mu m is successfully fabricated using direct current magnetron sputtering method. After deposition, the multilayer is sliced and polished to achieve the ideal aspect ratio. Characterization results show that the multilayer structure is kept intact and the surface roughness is approximately 0.9 nm after slicing and repeated polishing.

A recent development of mirrors is reviewed in this letter. For some applications, such as the hard X-ray telescope, polarization measurements in synchrotron radiation facilities, extreme ultraviolet (EUV) solar observations, and dense plasma diagnostics in China, a series of non-periodic novel multilayers with special performance are developed. X-ray supermirror, EUV broadband polarizer, EUV wide-angular mirror, and double period Kirkpatrick-Baez (K-B) mirror are successfully designed by using different multilayer stack structures.

太阳光谱中重要的He-Ⅱ谱线(波长30.4 nm)的观测对于研究太阳活动和日地空间环境具有重要意义，实现空间极紫外太阳观测需要采用多层膜作为反射元件。研究了工作在30.4 nm的Mg基多层膜。以反射率最高为评价函数设计了多层膜，采用直流磁控溅射技术制备了SiC/Mg,B₄ C/Mg和C/Mg多层膜，用X 射线衍射仪测量了多层膜的结构。研究表明虽然B₄C/Mg多层膜理论反射率最高，但实际制备结果显示，SiC/Mg多层膜的成膜质量最好，反射率最高。同步辐射反射率测量表明：在入射角10°时实测的SiC/Mg多层膜反射率为44.6%。

Influence of interface roughness on the reflectivity of Tungsten/boron-carbide (W/B4C) multilayers varying with bi-layer number, N, is investigated. For W/B4C multilayers with the same design period thickness of 2.5 nm, a real-structure model is used to calculate the variation of reflectivities with N=50, 100, 150, and 200, respectively. Then, these multilayers are fabricated by a direct current (DC) magnetron sputtering system. Their reflectivity and scattering intensity are measured by an X-ray diffractometer (XRD) working at Cu K\alpha line. The X-ray reflectivity measurement indicates that the reflectivity is a function of its bi-layer number. The X-ray scattering measured results show that the interface roughness of W/B4C multilayers increases slightly from layer to layer during multilayer growing. The variation of the reflectivity and interface roughness with bi-layer number is accurately explained by the presented real-structure model.

利用傅里叶变换(FFT)分析了纳米多层膜的X射线掠入射反射率测试曲线, 模拟了各种制备和测试条件对多层膜结构参数测试结果的影响, 检验了傅里叶变换方法的适用性和精确度。分析结果表明, 相对于传统的反射曲线拟合方法, 傅里叶变换方法具有直观和快速的优点, 在不引入主观的膜层结构模型的情况下可以较为准确地定出复杂的多层膜结构参数, 为多层膜结构表征提供了一种分析方法。